Optical Coating & Photolithography
From Volume Production to Precision Custom
From standard functional coatings on glass substrates to precision UV-to-IR optical filters, micron-level photolithographic patterning, and sputtered functional films on resin and 3D parts, we match the right coating process to your specifications and production volume.
Wavelength Range
Down To
Cleanroom
Volume Production
Optical Coating & Photolithography
From Volume Production to Precision Custom
From standard functional coatings on glass substrates to precision UV-to-IR optical filters, micron-level photolithographic patterning, and sputtered functional films on resin and 3D parts, we match the right coating process to your specifications and production volume.
Wavelength Range
Down To
Cleanroom
Volume Production
Photolithographic Patterning
By combining photoresist processing with thin-film deposition, different functional coatings can be placed precisely on one substrate for sensors, camera modules, encoders, and optical communication components.
Coating and Patterning in One Flow
Deposition and patterning are completed on the same line using lift-off or etching, reducing handling risk and lead time.
Micron-Level Accuracy
Mask alignment replaces mechanical holders, enabling dichroic line/space patterns down to 1 μm.
Sharp Boundaries, Smaller Gaps
Pattern edge blur of about 5 μm versus about 100 μm with metal masks, so adjacent filter regions such as RGB bandpass filters can sit side by side.
Multi-Function Integration
Combine several coatings on one substrate, such as dichroic + light-shielding or mirror + absorptive + AR, to simplify optical module design.
Patterning Specifications
- Patterning processLift-off / Etching
- Pattern accuracyLine/space down to 1 μm
- ExposureMask aligner
- Max. substrate sizeΦ6 in
- Max. substrate thickness25 mm (prisms supported)
- Dielectric multilayer patterningFilm thickness up to 7 μm
- EnvironmentISO Class 1 cleanroom
* Achievable accuracy depends on coating type and pattern design. Send us your drawings for evaluation.
Photolithographic Patterning
By combining photoresist processing with thin-film deposition, different functional coatings can be placed precisely on one substrate for sensors, camera modules, encoders, and optical communication components.
Coating and Patterning in One Flow
Deposition and patterning are completed on the same line using lift-off or etching, reducing handling risk and lead time.
Micron-Level Accuracy
Mask alignment replaces mechanical holders, enabling dichroic line/space patterns down to 1 μm.
Sharp Boundaries, Smaller Gaps
Pattern edge blur of about 5 μm versus about 100 μm with metal masks, so adjacent filter regions such as RGB bandpass filters can sit side by side.
Multi-Function Integration
Combine several coatings on one substrate, such as dichroic + light-shielding or mirror + absorptive + AR, to simplify optical module design.
Patterning Specifications
- Patterning processLift-off / Etching
- Pattern accuracyLine/space down to 1 μm
- ExposureMask aligner
- Max. substrate sizeΦ6 in
- Max. substrate thickness25 mm (prisms supported)
- Dielectric multilayer patterningFilm thickness up to 7 μm
- EnvironmentISO Class 1 cleanroom
* Achievable accuracy depends on coating type and pattern design. Send us your drawings for evaluation.
Sputtered Functional Films
High-speed sputtering causes minimal heat damage, forming uniform, dense, and highly adherent films on resin, metal, and 3D-shaped parts.
No Hard Coat Needed on Resin
With SiO₂ polymerization treatment, aluminum can be coated on acrylic and other resins without a hard coat, with no peeling after dozens of tape tests.
Uniform on Curved Surfaces
Film thickness is nearly identical at the top and bottom of steep lenses, keeping reflectance variation low.
Corrosion-Resistant Protection
Aluminum with a silicon oxide protective layer shows no change after more than 10 minutes under 1% KOH solution, with stable results in volume production.
Interference Colors
Multilayer interference produces a wide range of colors, and custom colors can be discussed.
Sputtering Specifications
- Max. workpiece sizeW160 × L325 × H110 mm
- Resin substratesPC, PET, PBT, ABS, PMMA, COP, COC
- Other substratesGlass, metal, silicon wafers, lenses, 3D parts
- Al mirror reflectance on resinApprox. 89–90% (400–700 nm)
- Batch consistencyNegligible variation across 5 batches
* Max. workpiece size refers to the effective area for Al + SiOx films. Reflectance measured on PC substrates.
Available Materials
Metal films
Oxide films
EMI Shielding Films
Ag > Cu > Al > Cr > Ti
Shielding performance ranking measured at 50 MHz–1 GHz. Oxide AR coatings provide no shielding.
- AlEffective from 50 nm, better at 500 nm+
- Ag, CuHigh shielding from 100 nm
- CrClear shielding from 500 nm
- TiEffective at 1,000 nm
Application Examples
Sputtered Functional Films
High-speed sputtering causes minimal heat damage, forming uniform, dense, and highly adherent films on resin, metal, and 3D-shaped parts.
No Hard Coat Needed on Resin
With SiO₂ polymerization treatment, aluminum can be coated on acrylic and other resins without a hard coat, with no peeling after dozens of tape tests.
Uniform on Curved Surfaces
Film thickness is nearly identical at the top and bottom of steep lenses, keeping reflectance variation low.
Corrosion-Resistant Protection
Aluminum with a silicon oxide protective layer shows no change after more than 10 minutes under 1% KOH solution, with stable results in volume production.
Interference Colors
Multilayer interference produces a wide range of colors, and custom colors can be discussed.
Sputtering Specifications
- Max. workpiece sizeW160 × L325 × H110 mm
- Resin substratesPC, PET, PBT, ABS, PMMA, COP, COC
- Other substratesGlass, metal, silicon wafers, lenses, 3D parts
- Al mirror reflectance on resinApprox. 89–90% (400–700 nm)
- Batch consistencyNegligible variation across 5 batches
* Max. workpiece size refers to the effective area for Al + SiOx films. Reflectance measured on PC substrates.
Available Materials
Metal films
Oxide films
EMI Shielding Films
Ag > Cu > Al > Cr > Ti
Shielding performance ranking measured at 50 MHz–1 GHz. Oxide AR coatings provide no shielding.
- AlEffective from 50 nm, better at 500 nm+
- Ag, CuHigh shielding from 100 nm
- CrClear shielding from 500 nm
- TiEffective at 1,000 nm